EDUCATION:
NATIONAL TSING-HUA UNIVERSITY                                         Hsinchu, Taiwan

College of  Engineering
PhD student in Material Science and Engineering.

NATIONAL DONG-HWA UNIVERSITY                                        Hualien, Taiwan

Master of Science in Material Science and Engineering, July 2002.
Thesis: Growth of Well-Aligned Carbon Nanotubes Using Fe/Ni Metals and Sub-Micrometer Fe Dots Array
Advisor: Ming-Show Wong, Yuan-Ron Ma.
　

FENG-CHIA UNIVERSITY                                                            Taichung, Taiwan

Bachelor of Science in Material Science and Engineering, June 2000.
　

EXPERIENCE:
INSTITUTE OF PHYSICS, ACADEMIA SINICA                             Taipei, Taiwan

Research Assistant, August 2002 –
Responsible for clean room job, electron-beam lithography technology, submicron pattern design,
magnetic thin film deposition, electricity resistance measurement and morphology analysis.

Experiment Skills

Thin film deposition: HFCVD/ PVD with high vacuum
Materials analysis : AFM, Real-time MFM, X-ray, and SEM/EDX
Clean Room Job: E-Beam lithography, Mask Aligner Lithography and Spin Coater
Current-Perpendicular-Plane fabrication and measurement, Low electricity measurement under low temperature
Micro-MOKE (Magneto-Optic Kerr Effect) measurement.

Computer & Modeling Skills

Used OOMMF to simulate pattern and used Original software to analyze electricity resistance.

NATIONAL DONG-HWA UNIVERSITY                                        Hualien, Taiwan

Research Assistant, Department of Material Science & Engineering, August 2000 – July 2002
Responsible for depositing multilayer hard thin film by PVD, analyzed morphology by atomic force microscopy,                                           and used both X-ray and FTIR to study thin film structure. Growth carbon nanotubes by HFCVD, and used                                SEM/EDX observed and analysis these tubes growth mode.

FENG-CHIA UNIVERSITY                                                            Taichung, Taiwan

Research Assistant, Department of Material Science & Engineering, August 1998 – July 1999.
Responsible for Shape Memory Alloy and Shape Memory Effect Research,                                                                                    Advisor: Hsin-Chih Lin.

RESEARCH WORK:

Publications:

• Y.R Ma, M.S. Wong, C.H. Shee, K.W. Cheng, J.C. Wu, Y. Liou and Y.D. Yao, “Thickness effect of nanosized thin-film iron dot on growth of multiwall carbon nanotubes”  Journal of Applied Physics Vol. 97, 10J707 (2005).
• M.S. Wong, K.W. Cheng, C.H. Shee, Y.R. Ma, J.C. Wu, Y. Liou and Y.D. Yao, “Size effect of nanosized thin-film iron dot on growth of multiwall carbon nanotubes”  Journal of Applied Physics Vol. 95, 11, pp 7291-7293 (2004).
• Y. Liou, D.C. Chen, C. Yu, J.S. Chen, S.F. Lee, Y.D. Yao, C.C. Tzeng, T.Y. Chen, K.W. Cheng, Y.R. Ma, “Magnetic switching and reversal process in a tip ring structure”  Journal of Applied Physics Vol. 95, 11, pp 6723-6725 (2004).
• Y.R Ma, K.W. Cheng, C.H. Shee, C.C. Tsai, C.L. Cheng, H.L. Liu, M.S. Wong, Y. Liou and Y.D. Yao, “Effect of field power on growth of multiwall carbon nanotubes” Journal of Magnetism and magnetic Materials 282, pp 61-64 (2004).
• E.W. Huang, C. Yu, K.W. Cheng, S.H. Wu, S.F. Lee, Y.D. Yao and Y. Liou, “Fabrication and Analysis of Nano Magnetic Patterns” Journal of The Vacuum Society of R. O. C. Vol. 16 pp15-23, (2003).

Posters:

ACTIVITIES:

       Member of Chinese Materials Society
Member of Chinese Vacuum Science Society
Member of Chinese Physics Society                                                                                                                                      Basketball Team leader of Materials Science and Engineering Department of Feng Chia University (1997-98)                           Class Leader 1997-1998                                                                                                                                                            200m number 8^th . Taichung first Senior High School (1994)
　

EXPERIMENTAL SKILLS (Instruments):

Thin Film Deposition with Sputtering/ Evaporation, Clean Room experiences: Mask Aligner, Spin Coater,                                         Atomic/ Magnetic Force Microscopy(NT-MDT and Digital Instrument),                                                                                                  X-Ray (Bruker AXS, Model D8), SEM (Hitachi 3500H), Physics Property Measurement System(Quantum Design PPMS),            Electron-beam lithography system (FEI-SEM with NPGS) .

COMPUTER SKILLS:

ORIGIN, OOMMF, MS-Office.

SETUP EXPERIENCES: